Carl Zeiss, Press releases


SCANNING PROBE MICROSCOPY / CUSTOMIZED SOLUTIONS / PRESS RELEASES
Cooperation of Zeiss and OMICRON for SNOM The ULTRAObjective™ The BEETLE™ UHV-SPM Cooperation of Zeiss and OMICRON for SNOM Based on a cooperation agreement Carl Zeiss Jena and OMICRON Vakuumphysik started a joint development in the field of scanning near-field optical microscopy (SNOM). The combination of conventional optical microscopes with SNOM provides a significant improvement in optical resolution far below the light wavelength. Optical spectroscopy capabilities associated with SNOM, and the combination with high resolution atomic force microscopy (AFM) opens a totally new field in materials and surface sciences. The expertise of both partners for optical microscopy and scanning probe microscopy forms a strong basis for a successful long-term cooperation. Jena & Taunusstein, Mai, 1996 If you are interested in receiving topical Email-information about results of this cooperation, please click here. The ULTRAObjective^TM Microscopy far below the diffraction limit A new objective is now opening up new horizons in microscopy. It permits the ideal combination of classical light microscopy and top-resolution scanning microscopy. With the ULTRAObjective™ from Surface Imaging Systems GmbH, Herzogenrath, Carl Zeiss has introduced a means of permitting the integrated and extremely convenient solution of widely varying, separate problems. The resolution capability of the light microscope has been extended down to a resolution of 1 nanometer. Micro- and nanostructures can be characterized qualitatively and quantitatively. Classical microscopy with its high operating convenience and productivity has now been extended by new types of contrast, such as topography, magnetic and potential contrast. It is possible not only to obtain images of extremely high resolution, but also to perform measurements in a very easy way. Applications range from new materials to microbiological, magnetic and semiconductor structures. Depending on the application, the ULTRAObjective™ can be combined with different microscopes from Carl Zeiss. Particularly efficient configurations are possible with the new Axioplan 2 and Axiophot 2 research microscopes recently launched. The objective is screwed into the nosepiece and thus integrated into the light microscope system. The interesting sections of the object are easily and conveniently relocated and can then be examined in detail using the ULTRAObjective™. Digital photomicrography or spectroscopy permits an extremely large variety of object characterizations to be performed, covering six orders of magnitude from the millimeter to the nanometer. For further information please contact Carl Zeiss Jena GmbH Zeiss Gruppe Unternehmensbereich Mikroskopie 07740 Jena Tel.: (03641) 64 2818 Fax: (03641) 64 2793 Pr.Nr. 3 (Vo) Januar 1996 d, e, f The BEETLE^TM UHV-SPM The new generation of scanning probe microscopes The Microscopy Business Group of Carl Zeiss is now introducing BEETLE™ UHV-SPM a new scanning probe microscope, which combines the benefits of the well-known BEETLE-tunnel microscope (formerly Besocke Delta Phi GmbH) with those of a new force microscope sensor. The BEETLE^TM UHV-SPM permits UHV examinations of exactly the same sample area in air and liquids, using force and tunnel microscopy . An oscillator crystal with a conductive probe is used as a force sensor, permitting AFM and STM images to be scanned simultaneously or by simple switch over without the use of an additional measuring head. A further benefit is the possibility of micro- and macro manipulation of the sample, permitting an area of 5 mm² to be analyzed in its entirety at maximum resolution. The high stability resulting from thermal drift compensation and a design insensitive to vibration is a further outstanding feature. The microscope features sub-angstrom resolution in the temperature range of fluid helium of up to 500 °C, thus paving the way for a wide field of applications ranging from the semiconductor technology, super conduction and materials research, and from crystallography to microbiology. The small and open structure permits easy combination with other analytical and processing techniques. such as in-situ epitaxial, laser- and corpuscular ray experiments, and chemical and physical surface reactions. The BEETLE™ UHV-SPM will therefore assume a special position in modern surface research. Pr.Nr. 29 (Vo) July 1995 d, e, f
Homepage \| Business Group If you have any suggestions and/or requests please contact [email protected].

SCANNING PROBE MICROSCOPY / CUSTOMIZED SOLUTIONS /
PRESS RELEASES

Cooperation of Zeiss and OMICRON for SNOM
The ULTRAObjective™
The BEETLE™ UHV-SPM

Cooperation of Zeiss and OMICRON for SNOM

Based on a cooperation agreement Carl Zeiss Jena and OMICRON Vakuumphysik started a joint development in the field of scanning near-field optical microscopy (SNOM). The combination of conventional optical microscopes with SNOM provides a significant improvement in optical resolution far below the light wavelength. Optical spectroscopy capabilities associated with SNOM, and the combination with high resolution atomic force microscopy (AFM) opens a totally new field in materials and surface sciences. The expertise of both partners for optical microscopy and scanning probe microscopy forms a strong basis for a successful long-term cooperation.

Jena & Taunusstein, Mai, 1996

If you are interested in receiving topical Email-information about results of this cooperation, please click here.

The ULTRAObjective^TM

Microscopy far below the diffraction limit

A new objective is now opening up new horizons in microscopy. It permits the ideal combination of classical light microscopy and top-resolution scanning microscopy.

With the ULTRAObjective™ from Surface Imaging Systems GmbH, Herzogenrath, Carl Zeiss has introduced a means of permitting the integrated and extremely convenient solution of widely varying, separate problems. The resolution capability of the light microscope has been extended down to a resolution of 1 nanometer. Micro- and nanostructures can be characterized qualitatively and quantitatively.

Classical microscopy with its high operating convenience and productivity has now been extended by new types of contrast, such as topography, magnetic and potential contrast.

It is possible not only to obtain images of extremely high resolution, but also to perform measurements in a very easy way. Applications range from new materials to microbiological, magnetic and semiconductor structures.

Depending on the application, the ULTRAObjective™ can be combined with different microscopes from Carl Zeiss. Particularly efficient configurations are possible with the new Axioplan 2 and Axiophot 2 research microscopes recently launched.

The objective is screwed into the nosepiece and thus integrated into the light microscope system. The interesting sections of the object are easily and conveniently relocated and can then be examined in detail using the ULTRAObjective™.

Digital photomicrography or spectroscopy permits an extremely large variety of object characterizations to be performed, covering six orders of magnitude from the millimeter to the nanometer.

For further information please contact
Carl Zeiss Jena GmbH
Zeiss Gruppe
Unternehmensbereich Mikroskopie
07740 Jena
Tel.: (03641) 64 2818
Fax: (03641) 64 2793

Pr.Nr. 3 (Vo)
Januar 1996 d, e, f

The BEETLE^TM UHV-SPM

The new generation of scanning probe microscopes

The Microscopy Business Group of Carl Zeiss is now introducing BEETLE™ UHV-SPM a new scanning probe microscope, which combines the benefits of the well-known BEETLE-tunnel microscope (formerly Besocke Delta Phi GmbH) with those of a new force microscope sensor.

The BEETLE^TM UHV-SPM permits UHV examinations of exactly the same sample area in air and liquids, using force and tunnel microscopy . An oscillator crystal with a conductive probe is used as a force sensor, permitting AFM and STM images to be scanned simultaneously or by simple switch over without the use of an additional measuring head.

A further benefit is the possibility of micro- and macro manipulation of the sample, permitting an area of 5 mm² to be analyzed in its entirety at maximum resolution. The high stability resulting from thermal drift compensation and a design insensitive to vibration is a further outstanding feature.

The microscope features sub-angstrom resolution in the temperature range of fluid helium of up to 500 °C, thus paving the way for a wide field of applications ranging from the semiconductor technology, super conduction and materials research, and from crystallography to microbiology.

The small and open structure permits easy combination with other analytical and processing techniques. such as in-situ epitaxial, laser- and corpuscular ray experiments, and chemical and physical surface reactions.

The BEETLE™ UHV-SPM will therefore assume a special position in modern surface research.

Pr.Nr. 29 (Vo)
July 1995 d, e, f

Homepage | Business Group

If you have any suggestions and/or requests please contact [email protected].

Cooperation of Zeiss and OMICRON for SNOM

The ULTRAObjectiveTM

Microscopy far below the diffraction limit

The BEETLETM UHV-SPM

The new generation of scanning probe microscopes

The ULTRAObjective^TM

The BEETLE^TM UHV-SPM